KLA-Tencor Introduces First Ultraviolet-Based Automated Inspection System for Reticles Used in DUV Lithography
SAN JOSE, Calif.--(BUSINESS WIRE)--MAY 20, 1998--KLA-Tencor Corp. (NASDAQ:KLAC) today introduced the industry's first automated ultraviolet-based (UV) reticle inspection system for deep UV (DUV) lithography.
The 353UV delivers the high sensitivity needed to inspect today's extremely complex reticles, as well as support the development of reticles for the next generation of advanced integrated circuits (ICs).
"As shrinking device geometries push current lithography techniques to the limits, high quality photomasks have become an enabling technology in the development of next-generation devices," stated Ed Grady, KLA-Tencor's vice president and general manager of the RAPID Division.
"KLA-Tencor's new reticle inspection system delivers the 150 nanometer sensitivity required to inspect the reticles used in leading-edge UV and deep UV lithography, making it ideal for applications such as pattern verification and process development. This capability is critical for providing the enhanced defect detection needed to capture a whole new class of defects that can become yield killers at 0.18 micron geometries."
In addition, the 353UV's increased performance provides the reticle inspection capabilities needed to maintain acceptable yields in the production of today's advanced quarter-micron devices.
The 353UV's new software and algorithm package detects a greater spectrum of critical, wavelength-specific defects on binary, optical proximity correction (OPC) and phase shift masks.
Many of these defects-which include incorrectly sized geometries, transmission errors, and critical dimension (CD) uniformity-were either undetectable at longer wavelengths or non-critical for larger design rules, but may seriously impact wafer yield in sub-quarter micron device production.
The combination of the high sensitivity UV optics, the new algorithm package, and defect highlighting improve the detection and classification of subtle mask pattern errors.
DuPont Photomasks Inc. (DPI) (NASDAQ:DPMI), the world's leading photomask manufacturer, performed preliminary evaluations of the 353UV. "Our extensive experience in the development and production of advanced reticles, including those with OPC features, uniquely qualified us to test the new system," said Preston Adcox, president and chief operating officer of DuPont Photomasks, headquartered in Round Rock, Texas.
"DPI engineers ran initial test and production reticles on the 353UV and were impressed with the results achieved, as well as with the system's ability to reduce setup and maintenance time. Building on the strategic alliance formed between DPI and KLA-Tencor in 1996, this project will allow DPI to provide our customers early access to high quality deep sub-micron reticles."
An extension of KLA-Tencor's proven 300 Series platform, the 353UV uses ultraviolet, transmitted light technology to compare etched geometries on the photomask with either an identical pattern on the mask or with a matching database configured within the inspection system. The system's development on the 300 Series platform makes it possible to upgrade existing 300 Series systems with UV inspection capabilities.
The 353UV was developed under KLA-Tencor's UV/DUV engineering program, partially funded by SEMATECH, with the goal of developing technologies needed to support photomask development and production down to the 130 nanometer level.
"SEMATECH chose to partner with KLA-Tencor in developing these reticle inspection advances based on their long-standing expertise in the field," stated Karen H. Brown, director of lithography, SEMATECH.
"KLA-Tencor pioneered the first automated reticle inspection tools used in the industry and has continued to drive forward the development of new technologies for pattern and contamination inspection."
About KLA-Tencor: KLA-Tencor is the world leader in yield management and process control solutions for semiconductor manufacturing and related industries. Headquartered in San Jose, the company has sales and service offices around the world. An S&P 500 company, KLA-Tencor is traded on the NASDAQ National Market under the symbol KLAC. Additional information about the company is available on the Internet at kla-tencor.com.
--30--mr/sf* ms/sf
CONTACT:
KLA-Tencor Corp.
Roberta Emerson, 408/875-3000 (V.P., Corporate Comm.)
or
MCA Inc.
Chris Castillo, 650/968-8900
|
