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Technology Stocks : General Lithography
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To: FJB who wrote (1023)5/29/1998 9:31:00 AM
From: Katherine Derbyshire  Read Replies (3) of 1305
 
Both e-beam and laser systems are capable of producing PSMs. E-beam systems have inherently higher resolution, laser systems are inherently faster, so there's a tradeoff between the two for any particular mask.

To my knowledge, PSMs are not yet being used in production applications. Current production technology (0.25 micron features) is pretty close to the exposure wavelength (248 nm), so the resolution enhancements needed are relatively minor. A PSM is a two-level mask, so using PSMs is a pretty radical step that chip makers won't take until they have to.

Katherine
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