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Politics : Formerly About Applied Materials

AMAT 341.36

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3:59 PM EST

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To: Skeeter Bug who wrote (19803)	6/1/1998 1:53:00 PM
From: eabDad	Read Replies (1) of 70976

Skeet: I have a pretty complete set of information, at least for now. My reference to 0.28-0.30 micron was what was actually being shipped in quantity today. The NEC 0.15 micron thing is for production in 2002 - that seems ok for start of ramp. The Hitachi 0.18 micron announcement is typical for a new process - it will take two years at least for this to become the bulk shipment technology. With the ASIC guys you have to be careful whether or not they mean "as drawn" or "L effective". As Drawn refers to the image on the mask (what equipment guys track) vs. the distance between the source and drain within the silicon - effective gate length. The L-eff is shorter than as drawn because there is a diffusion laterally during process. A 0.25 as drawn is 0.18 L-eff. BTW, I did not take offense, although I thought your were unjustifyably flaming MU mgmt a bit much. Z

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