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Technology Stocks : General Lithography
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To: Brad Rogers who wrote (1058)7/14/1998 12:00:00 PM
From: Andrew Vance  Read Replies (1) of 1305
 
Very nice article. It makes a great deal of sense to me. This type of processing will extend the life of DUV lithography, if implemented. It is a real good "mix-and-match" strategy that will allow a majority of the wafers to be processed using DUV and allowing for the most critical feature sizes on the critical levels to be processed with the lower throughput e-beam systems. This will also prove to be extremely cost effective.

After reading this, the first thing that popped into my mind was UTEK, since it has both systems in-house and could create its own internal mix and match strategy. I still believe the Ultrabeam will be metamorphized into a direct write wafer system. When coupled with the ISI DUV system or the EUV LLC system developed, you have a total solution under one roof. I should talk to Art about this.

Andrew
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