Andrew,
Do you know anything about the issue of vectorscan vs. rasterscan? We had a debate going on about it late last year on the Etec thread. One of the selling points about the Ultratech Stepper's vectorscan was that it was supposed to be so much faster than Etec's rasterscan, at least in some less-complex mask-making tasks. In light of this, what do you think of today's press release?
>>SAN FRANCISCO--(BUSINESS WIRE)--July 14, 1998--Etec Systems Inc.
(NASDAQ:ETEC), a leader in patterning solutions for the worldwide
semiconductor and electronics industries, today announced the
introduction of the MEBES(R) 5000, an electron-beam raster-scan
pattern generation system tested to new, more rigorous "composite"
specifications, that establishes an unparalleled standard for pattern
generator performance.
The MEBES 5000 is featured in the Etec booth (No. 1716) at
SEMICON West 98, currently taking place at the Moscone Center in San
Francisco.
According to Frank Abboud, vice president of product development
for Etec Systems, "This product is a response to our customers'
requirements for a new line of higher performance MEBES systems. We
developed the MEBES 5000 system to meet the accuracy and throughput
requirements of the 0.18 micron mask generation, building upon
experience gained from the more than 150 MEBES systems installed
worldwide. With this new system, the user retains control of the
design grid, writing strategy and exposure parameters. This allows the
maskmaker to optimize results for leading edge mask production as well
as for mask development." Abboud continued, "We are excited about the
many new features and the important benefits the MEBES 5000 brings to
our customers. One of the greatest benefits of the new system is its high speed; the MEBES 5000 will allow production of complex 0.18 micron device generation masks as much as eight times faster than MEBES 4500..."
Full article:
biz.yahoo.com
--PD |
