SI
SI
discoversearch

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor.  We ask that you disable ad blocking while on Silicon Investor in the best interests of our community.  If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.
Politics : Formerly About Advanced Micro Devices
 Public ReplyPrvt ReplyMark as Last ReadFilePrevious 10Next 10PreviousNext  
To: Petz who wrote (34902)7/21/1998 10:10:00 PM
From: Yousef  Read Replies (1) of 1573433
 
John,

Re: "Explain the phrases "LI is shown like a W plug"

There are two ways of "doing" Local Interconnect (LI) ... 1) Enlarge
the contacts so that they cover from Poly to Source/Drain. Then when
tungsten fill is done, the poly line is connected to the S/D ... 2) Put
in two additional masking steps to pattern a dielectric and conductor layers.
This has the advantage that LI can pass over a poly line and allow two
S/D's to be connected without "shorting" to poly. This method is obviously
much more complex and looks like a Metal 0 option.

The issue with the first approach is that now you have contacts of different
sizes (without LI, all contacts are the same size) ... contacts of different
size etch at different effective rates (smaller contacts etch slower). Thus
control of the contact etch can be an issue.

Hope this helps.

Make It So,
Yousef
Report TOU ViolationShare This Post
 Public ReplyPrvt ReplyMark as Last ReadFilePrevious 10Next 10PreviousNext  

HomeMailHotSubjectMarksPeopleMarksKeepersSettings
Terms Of UseContact UsCopyright/IP PolicyPrivacy PolicyAbout UsFAQAdvertise on SI
© 2025 Knight Sac Media.  Data provided by Twelve Data, Alpha Vantage, and CityFALCON News