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Politics : Formerly About Advanced Micro Devices
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To: Yousef who wrote (35190)7/29/1998 12:37:00 PM
From: MikeyB  Read Replies (1) of 1572558
 
I am curious. What makes everybody assume that AMD has not been doing process development on low-K dielectrics such as SOG and flourinated HDP??? And what would prohibit them from implementing a low-K process along with Cu??

It also seems that everyone agrees that a Dual Damascene approach has fewer process steps. Whether the difference is 20%, 40% or 60%, the difference is still significant. It also appears that everybody thinks that each process step requires the same cycle time. The cycle times of each step vary considerably. Using Yousef's process flow (which is the correct one), I suspect that his 20% reduction of process steps would result in approximately a 40% decrease in cycle time.

MikeyB

PS: To all the experts out there, what are the benefits of indium implants?
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