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Politics : Formerly About Advanced Micro Devices

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To: Yousef who wrote (35190)7/29/1998 6:52:00 PM
From: Maxwell  Read Replies (2) of 1572566
 
Yousef:

<<I am very disappointed in your technical understanding ... the process flow that I originally gave you was for a dual Cu damascene process flow. Your flow won't work ... want to explain how you do contact masking and trench masking at the same time as well as the etch ... didn't think so. >>>

The process flow I gave you is the ADVANCED DUAL DAMASCENE process. If you are nice to everyone here I will give you the secret to this process. It is a patented technology.

Maxwell
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