LAMBDA PHYSIK lasers:
Overview: Lambda has three lasers doing .18-.1 projections. Two are planed for mass production late this year. Companies dont mass produce lasers if they are not qualified. Cymer's monopoly is deteriorating.
1)NovaLiner K2000:
A high power/high repetition rate excimer laser for DUV microlithography, at SEMICON WEST. This 248 nm KrF laser delivers 20 W of output power at a 2 kHz repetition rate, a power level over twice that of its predecessor. This advance translates directly into improved throughput in microlithography steppers and scanners. Furthermore, output power is actively controlled using Lambda Physik's proprietary PowerLokr energy stabilization system to ensure overall exposure dose stability to better than 0.5%. The line narrowed NovaLiner model K2010 also provides a spectral bandwidth of less than 0.6 pm (FWHM), permitting this laser to be used with all refractive, high NA lenses for the production of circuit features as small as 0.18 æm.
The performance of the NovaLiner K2000 was achieved through new switching circuitry to enable 2 kHz operation, as well as tube design improvements for better pulse-to-pulse stability. This product is based on the same reliable, proven NovaTuber construction that gives other NovaLiner lasers their high mean time between failure (MTBF), minimal maintenance downtime and low cost of ownership. In fact, 1 kHz NovaLine LITHO lasers can even be upgraded to 20 W/2 kHz operation.
Volume production of the NovaLiner K2000 is scheduled to begin in the last quarter of 1998.
2)NovaLiner A1000 Excimer Laser:
Lambda Physik introduced the new NovaLiner A1000 excimer laser at SEMICON WEST. This is a second generation, 193 nm ArF excimer laser intended for DUV microlithography. The line narrowed NovaLiner model A1010 produces 5 W of output power at a 1 kHz repetition rate. This power is delivered with a spectral bandwidth of less than 0.6 pm (FWHM), enabling the laser to generate circuit structures smaller than 0.18 æm using all-refractive projection optics. Output is actively controlled using Lambda Physik's proprietary PowerLokr energy stabilization system to achieve an overall exposure dose stability of better than 0.8%.
In addition to enhanced performance, the NovaLiner A1000 utilizes proven NovaTuber construction and numerous innovations to deliver exceptional reliability, low maintenance downtime and reduced cost of ownership. For example, careful selection of materials has improved transmission characteristics of the internal resonator optics, resulting in increased mean time between failure (MTBF) and lower operating costs. New solid state switching circuitry also yields increased efficiency.
With its unique combination of high performance and exceptional reliability, the NovaLiner A1000 represents a major step towards economical production microlithography at 193 nm.
Volume shipment of the laser is scheduled for the third quarter of 1998.
3)NovaLiner F500:
The new NovaLiner F500 from Lambda Physik is the first high power F2 excimer laser on the market to enable system and process development of microlithography at feature sizes of 0.1 æm and below. This 157 nm laser delivers 10 W of stabilized output power at a repetition rate of 500 Hz, with a maximum achievable power of 20 W. Output is actively controlled to provide a highly stable exposure dosage over a fixed number of pulses.
The NovaLiner F500 utilizes Lambda Physik's NovaTuber all metal/ceramic tube technology, together with our extensive experience in the production of industrial F2 excimer lasers, to achieve a unique combination of outstanding performance and high reliability. Innovations in the model F520 laser include a patented resonator design that yields a bandwidth of only 10 pm (FWHM), allowing the use of catadioptric projection optics. Future efforts are aimed at reducing this bandwidth even further. |
