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Technology Stocks : Semi-Equips - Buy when BLOOD is running in the streets!
LRCX 154.74-0.8%3:59 PM EST

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To: Juniper who wrote (7050)9/29/1998 6:09:00 PM
From: Katherine Derbyshire  Read Replies (1) of 10921
 
Unfortunately I'm not an IEEE member, so I can't read the original article. Just off the top of my head, though, any kind of contact lithography is going to have major problems in full-scale manufacturing because of contamination and the risk of damage to the mask and the wafer. That's why the industry moved away from contact printing in the first place.

Other than the contact printing aspect, the technique sounds similar to phase shift masks. People have printed features below 0.10 micron using phase shift masks with 248 nm lithography, and PSMs are rapidly becoming part of the standard lithography toolkit. PSM was invented at IBM, but I wouldn't give them credit for perfecting it.

More information about phase shift masks can be found at:
news.semiconductoronline.com
news.semiconductoronline.com

Katherine
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