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Technology Stocks : General Lithography
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To: Katherine Derbyshire who wrote (1001)1/10/1999 9:19:00 PM
From: curtis fincher  Read Replies (1) of 1305
 
Sorry that it took 7 months for me to notice the reply. Nevertheless, the reason new resists are needed at 193 is that the currently used PHOST resist at 248 does in fact absorb strongly at 193 as any aromatic polymer will. The difficult end of the problem is a polymer with sufficiently small absorption at 193 but with relatively high etch resistance. If the absorption is small at 193, you are nearly guaranteed small absorption at 248 a lower energy probing less of the electronic structure of the system. Standard systems that look like the probable winners at 193 like the cyclic olefins will work at both wavelengths provided that you choose the PAG appropriately.
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