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To: Ritz who wrote (1947)	1/31/1999 12:07:00 PM
From: FJB	Read Replies (2) of 2946

Ritz, If F2 really is feasible wouldn't you think that a .09 node would be moved up to 2003 or perhaps even 2002 for early adopters? Most of the expert commentary I've read makes me think that is overly aggressive. The time from introduction of an exposure technology to 10% market penetration is also getting longer. Projection aligners reached the 10% mark only two years after production systems were introduced, versus 10 years for 248 nm systems. In light of this trend, Rinnen suggested that forecasts calling for 193 nm lithography to become mainstream by 2002, only 4 years after the first production-ready system, may be overly aggressive. news.semiconductoronline.com Bob

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