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Technology Stocks : IBIS
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To: dmcl who wrote (214)3/20/1999 11:19:00 PM
From: HerbVic  Read Replies (1) of 301
 
FWIW Just stumbled across this on the UT Austin web page concerning
Technologies Available for Licensing.
utexas.edu

Fabricating Under Exceptionally Mild Conditions Silicon-On-Insulator
Structures: Growth Of Polycrystalline CaF2 Via Low Temperature
Organometallic Chemical Vapor Deposition

DESCRIPTION

This invention is an improved method of fabricating under exceptionally mild conditions
silicon-on-insulator (SOI) structures based on a layer of calcium fluoride (CaF2) as the
insulator. The method uses specially developed organometallic precursors and a chemical vapor
deposition (OMCVD) reaction to form polycrystalline CaF2.

The chemical vapor deposition is accomplished by placing an organocalcium compound and a
gas which is a source of fluorine in a reactor allowing ready access to the substrate. Since the
reaction occurs at a lower temperature, defects associated with higher temperature deposition
like layer mixing, wafer warpage, and film stress associated with high temperature deposition
are significantly reduced. The preferred volatile organometallic precursor is
bispentamethylcyclopentadienyl calcium, and the preferred source gas of fluorine is SiF4 or
NF3.

APPLICATION

The successful development of SOI material structures opens up the possibility of fabricating
three dimensional integrated circuits. Additionally, SOI material structures will allow
fabrication of memory and logic circuits that are immune to both soft errors due to alpha
particles and single particle upset events caused by high-energy particles.
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