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Technology Stocks : Lam Research (LRCX, NASDAQ): To the Insiders
LRCX 238.61+2.2%11:39 AM EST
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To: Duker who wrote (2662)3/21/1999 9:27:00 PM
From: Jong Hyun Yoo  Read Replies (1) of 5867
 
DuKer:
The question you raised regarding the tradeoff between photoresist
selectivity versus Oxide etch rate is a very complicated one.
HOwever, If I can give you a very simplified answer, I would say that
for a process condition that gives you a high etch rate, you are
likely to have a poor selectivity of PR while if you have a good
PR selectivity, you etch rate might suffer. That's why oxide etching
is a very technically challenging area.

Both Lam's 9100PTX and AMAT's IPS system have the same problem
as far as I know. AMAT's IPS system is a greatly improved version
of its HDP Oxide etcher in terms of hardware reliability and configuration. However, I get the impression that it is having a bit of problem with the process performance. 9100PTX is not without the
problem either. It has improved the hardware performance significantly. However, it seems like it still has some areas of
improvement with process repeatability. As for Tel, it has won many
orders from Samsung, Hyundai, Intel, ect... because of its
hardware reliability and process repeatability. Lam has lost
good market share to Tel in the oxide etch area in the past years.
However, encouraging news is that Tel seems to be having problems
with smaller geometry features. As chipmakers accelerates its
transition to smaller feature size (0.13 micron by year's end),
Lam will have a plenty of opportunities to recapture the lost
market share.
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