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Technology Stocks : ASML Holding NV

ASML 1,014

-2.2%

3:18 PM EST

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To: vince doran who wrote (532)	3/24/1999 11:32:00 AM
From: TI2, TechInvestorToo	Read Replies (1) of 42392

Very little impact imho. To succeed you need 2 reticles (one psm)and different illuminator settings for each exposure. Difficult to implement on existing steppers in production environments. New stepper needs the ability to quickly and accurately swap reticles and illuminator settings. This idea was published recently at SPIE. ASML published better results the next day without any tricks with both 248nm and 193 nm exposure systems with single (binary) masks. Very impressive according to reports from conference attendees. The moral is that optical extensions will continue so that next gen lithography will likely be pushed out to <70nm. TI2

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