Canon's new 150-nm stepper handles 117 wafers an hour
[Here is the machine that Papkin was so excited about ... warning ASML and Nikon that they should not count Canon out ... --Duker]
A service of Semiconductor Business News, CMP Media Inc.
Story posted 9 a.m. EST/6 a.m., PST, 4/6/99
UTSUNOMIYA, Japan--Canon Inc.'s Semiconductor Equipment Division here has rolled out a new step-and-repeat wafer exposure tool, using a krypton fluoride (KrF) excimer laser for the fabrication of ICs with 0.15-micron feature sizes. Canon said its new stepper is the first deep-ultraviolet (DUV) system with an "ultra-low aberration" NA 0.65 lens, and it can achieve a throughput of 117 (200-mm) wafers an hour.
The new step-and-repeat tool is aimed at chip manufacturing operations that need to push deeper into submicron processing, but do not require the larger field sizes of step-and-scan systems, according to Canon officials. The FPA-3000EX6 stepper also features the first lens designed specially for use with Canon's new optical lithography extension technique, called IDEAL (for Innovative Double Exposure by Advanced Lithography). Canon says IDEAL is capable of extending the resolution of a tool to one-half the wavelength of the illumination light (see Feb. 12 story).
Canon plans to exhibit the EX6 stepper at the Semicon Europa '99 chip manufacturing trade show in Munich next week (April 13-15). The first deliveries of the tools are scheduled to begin in September. Canon said the unit price of the stepper will vary, but the system sells for about $7 million, and it now anticipates shipping 100 of the tools during the next 12 months.
"The EX6 provides a simple, cost effective way of extending an existing 200-mm fab down to the 150-nm technology node," said Phillip Ware, assistant general manager and director of technical marketing for Canon USA Inc.'s Semiconductor Equipment Division. "It allows our customers stay with 5X reticles and continue to generate profits with their current 200-mm asset base for several more device generations."
The use of the IDEAL technology will potentially push the new stepper's resolution below 120-nm, according to Canon. Therefore, the company said it has incorporated vibration isolation technology used in its 5000 Series 200mm/300mm scanner platforms to enhance stability and overlay accuracy in the EX6.
Canon also said it has improved linear motors, tightened component tolerances and implemented new assembly procedures to improve the performance of the new stepper. New batch streaming software also maximizes EX6 throughput for any lot size, according to Canon.
"We've applied our reengineering program across the board with the EX6," Ware said.
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