Cymer and Carl Zeiss Form Strategic Alliance
Cooperative Agreement Signed to Determine Optical Requirements for Lithography Light Sources
SAN DIEGO, May 10 /PRNewswire/ -- Cymer, Inc. (Nasdaq: CYMI), the world's leading supplier of illumination sources essential for deep ultraviolet (DUV) photolithography, and Carl Zeiss Lithos, a subsidiary of Carl Zeiss, an innovative technology leader in optics and precision engineering, today announced they have formed a strategic alliance to facilitate joint development and design efforts of leading-edge optical components and modules for lithography light sources in alignment with the Semiconductor Industry Association (SIA) roadmap. Optics have become an increasingly critical component of light sources for lithography tools as finer resolutions and line widths are required for the semiconductor industry to remain on or exceed Moore's Law curve.
"We are extremely pleased to have formed this alliance with Zeiss," said David Skinner, vice president of global supply management for Cymer. "Both companies will gain a better understanding of the interaction between the light source and the optics within the lithography tool. This knowledge will be crucial as Cymer continues to develop next-generation light sources to support the global lithography marketplace. Zeiss' unique capabilities and expertise in optics and coatings, along with Schott ML's optics materials development, complements Cymer's proficiency in providing next-generation light sources for lithography."
"It is a major step to form this alliance with the leading supplier of illumination sources for microlithography," said Jurgen Krause-Bonte, general manager of Carl Zeiss Lithos. "The partnership reflects the successful common activities to manufacture leading-edge optical components together with Schott ML and their key competence in the field of optical materials for lithography. The cooperation with Cymer strengthens the Carl Zeiss focus to form strategic alliances with leading-edge semiconductor equipment companies."
Forward Looking Statements
Statements in this press release regarding new product development efforts involve a number of risks and uncertainties. Actual results may differ materially from those projected in any such statements due to various factors, including, but not limited to: the industry demand for next-generation light sources and the ability of the parties to develop optics and light source products to meet these demands.
Cymer, Inc. is the world's leading supplier of excimer laser illumination sources, the essential light source for deep ultraviolet (DUV) photolithography systems. DUV lithography is a key enabling technology, which has allowed the semiconductor industry to meet the exact specifications and manufacturing requirements for volume production of today's advanced semiconductor chips. Further information on Cymer may be obtained from the Company's SEC filings, the Internet at cymer.com or by contacting the Company directly.
Carl Zeiss is an innovative technology leader in the fields of optics and precision engineering. Products include eyeglasses, binoculars, etc., medical systems for microsurgery, microscopes as well as metrology tools for the automotive industry. The business group, Semiconductor Technology, develops and produces leading edge lithography systems for wafer steppers as well as inspection microscopes for defect classification (up to 300mm wafers) and mask simulation tools. Further information on Carl Zeiss may be obtained from the Internet at zeiss.de or by contacting the company directly.
SOURCE Cymer, Inc.
/CONTACT: Markus Wiederspahn, Marketing Communications Mgr. of Carl
Zeiss, +49-7364-20-2194, Fax: +49-7364-20-3370; Leslie Cole, Dir., Marketing
Communications, +1-619-451-7149, Fax: +1-619-618-3035, or Marie Burke, Dir.,
Investor Relations, +1-619-618-5232, Fax: +1-619-618-3090, both of Cymer,
Inc./
/Web site: zeiss.de
/Web site: cymer.com |
