FSII - The Worst is Over? Message Board

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Technology Stocks : FSII - The Worst is Over?

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To: Donald Wennerstrom who wrote (2472)	5/28/1999 8:14:00 AM
From: SemiBull	of 2754

FSI offers 300-mm lithography tool using 200-mm platform CHASKA, Minn.--FSI International Inc. here today introduced a new 300-mm wafer cluster tool for photoresist processes that leverages off the company's existing 200-mm platform for improved performance and reduced size. The Polaris 3500 Cluster tool is aimed at photolithography process applications for devices with 0.15-micron design rules, FSI said. The new tool and its 200-mm predecessor--Polaris 2500--are based on a common platform that uses the same wafer handling system, environmental control system and software. Reuse of these systems and software reduces "the inherent risk in 'starting over' on unproven scaled-up track designs," said Ardy Johnson, vice president sales and marketing for FSI's Microlithography Division. "It also means that our customers can take advantage of the higher throughput and utilization that the modularity and flexibility of the platform make possible," he added. The cluster configuration also makes the 300-mm wafer processing system smaller in footprint than conventional 200-mm track designs, according to FSI.

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