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Technology Stocks : Dupont Photomasks (DPMI) -- Ignore unavailable to you. Want to Upgrade?

To: Duane L. Olson who wrote (862)	6/16/1999 5:26:00 PM
From: Bookdon	Read Replies (2) \| Respond to of 955

In the referenced report Paul Warkentin (Etec) said that mask makers would need to go to KLA for more complicated (expensive) measuring tools. You will find that in many mask shops the bottleneck is the inspection tools rather than the lithography equipment. The very small features on OPC and phase-shift masks don't need to be fully resolved by the writing tools. This can give rise to the detection of false defects by the inspection equipment. This is a very strong incentive to buy expensive next-generation inspection gear even before new mask-writers are required.