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Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?

To: orkrious who wrote (22239)	6/14/1999 1:58:00 PM
From: BillyG	Respond to of 25960

SVG plans first EUV tools by 2003, says project is on track A service of Semiconductor Business News, CMP Media Inc. Story posted 11:15 a.m. EST/8:15 a.m., PST, 6/14/99 SAN JOSE--Silicon Valley Group Inc. here today said it is on track to present technical details and a business plan for the first generation of extreme ultraviolet (EUV) lithography tools after successfully passing a milestone review consortium members of the EUV Limited Liability Co. (EUV LLC). The first EUV tools are now slated to become available in 2003 and will be cable of producing 0.07-micron and below drawn feature sizes, said SVG officials. "Our EUV tool approach provides for multiple generations of EUV systems with risk being contained by using SVG technology for alignment, auto-calibration, focus and optics scanning," said Noreen Harned, vice president of the EUV program at SVG. In addition, the company has leveraged development provided by the Virtual National Laboratory and several key contractors for sources and materials management, Harned added. SVG said it passed a critical milestone and design review stipulated under its partnership with the EUV LLC. The EUV consortium was launched by Intel, Motorola and Advanced Micro Devices in 1997 to develop and promote the technology as a candidate for post-optical lithography in the next decade (see Sept. 11, 1997, story). To develop Next-Generation Lithography (NGL), EUV alliance is working with research organizations and suppliers, including SVG and the Virtual National Laboratory (VNL)--which is comprised of Lawrence Berkeley National Laboratory, Lawrence Livermore National Laboratory and Sandia National Laboratories under the auspices of the Department of Energy. "The accelerated industry technology roadmap has put the pressure on NGL development," said John Shamaly, corporate vice president of SVG. "Our all-optical roadmap completes the technology gap at the 100-nm node with a 157-nm product. Our EUV program is set to complete the drive toward meeting industry requirements. "Timing of our first-generation EUV tools is 2003 with volume production for circuit features at 70 nm and below expected for 2005," Shamaly added. The EUV camp is racing other leading technologies for post-optical lithography. During a NGL workshop last year, International Sematech endorsed EUV and Electron Projection Lithography (EPL) as leading candidates for Next-Generation Lithography (see Dec. 17, 1998, story). Also still being pursued by other companies are x-ray and an ion-beam projection approach.

To: orkrious who wrote (22239)	6/14/1999 7:50:00 PM
From: orkrious	Respond to of 25960

When AMAT announced they were well-positioned for 300mm (with INTC's announcement I sent the following email to Marie Burke at Cymer. Wouldn't it be a good idea to get your PR company to put out a press release stating that every 300mm fab will require several (how many?) Cymer lasers? Applied Materials just put out a similar press release. See the link below: biz.yahoo.com She responded with this Hi Jay: > > Thanks for the input. > > I apologize for not getting back to you sooner, but I have been out of the office. Given the recent stock appreciation, I gather you are not as concerned today about getting the word out as to the possible benefits to accrue to Cymer as a result of the Intel announcement as you were at 6:30AM Thursday. > > The switch to 300mm will involve almost a complete retooling of fabs to be able > to process 300mm wafers. Intel has announced that it will spend over $1B on its first 300mm fab in Oregon alone. Applied Materials, being the largest semiconductor equipment manufacturer with dominant market share across multiple segments of the industry will undoubtedly benefit from such a switch. Hence it's a no brainer for them to issue a press release claiming they stand to gain a lot from such a switch. > > We at Cymer, despite having over 97% market share of the installed based of DUV excimer lasers, and being extremely confident in the future of our technology, prefer to be conservative with respect to claims of future business. Our policy is to only put out press releases when we have firm orders. We find this is a much better way to conduct our overall communication efforts than trying to quantify the benefits we will receive from each such announcement. My response to her just now: I am always concerned about Cymer's price <VBG>, but it does seem that the market is finally realizing Cymer's potential. As much as I'd like to see you pump your prospects, I can't argue with your conservative approach. There is nothing wrong with under-promising. As the DUV market takes off, you will over-deliver, a combination wall street loves.