To: Doug B. who wrote (1458 ) 7/6/1999 3:20:00 PM From: Ian@SI Read Replies (2) | Respond to of 3661
Here's the first.... How many more announcements before Semicon West is done? ... ++++++++++ Tuesday July 6, 2:09 pm Eastern Time Company Press Release Mattson Technology to Introduce New Epitaxy Reactor System At SEMICON West 1999 FREMONT,Calif.--(BUSINESS WIRE)--July 6, 1999--Mattson Technology Inc. (NASDAQ: MTSN - news), a global supplier of advanced process equipment used to manufacture semiconductors, today announced it will introduce the EpiPro 5000 Epitaxial Silicon Deposition System at SEMICON West 99. The EpiPro deposits a full range of silicon film thicknesses on silicon wafers up to 200 mm in diameter for discrete, bipolar and MOS devices, which are used in a variety of products ranging from computers to electric cars. The new system combines the innovative technology, productivity and reliability enhancements obtained from a worldwide installed base of 400 epitaxial systems. Mattson is a key exhibitor at SEMICON West 99, to be held July 12-14, at San Francisco's Moscone Center, South Hall, Booth No. 218. The company has received multiple system orders for the system and will begin shipping in Q3 1999. ''The EpiPro 5000 is a good example of Mattson's core vision of continually advancing technology and improving productivity. We feel this system has better uniformity than any other batch epi system in the world. At the same time, it provides a big increase in throughput, thereby reducing the cost of ownership,'' said Brad Mattson, CEO of Mattson Technology. ''We believe this combination will be a huge draw in this market segment.'' Mattson Technology acquired Concept Systems Design on August 5, 1998. Concept manufactured a line of epitaxy equipment that included the venerable Gemini line of epitaxial reactors. A combination of features provides the EpiPro reactors with significantly improved film quality and in cost of ownership through high wafer throughput. The dual chambered EpiPro 5000 is the only epitaxial reactor that has the flexibility to process a broad range of epitaxial silicon thicknesses, from 1 to more than 100 microns, with tight process control for all film thicknesses. The chamber's patented, bell-jar design provides uniform delivery of reactant gases over a large area. An ex situ fiberoptic sensor measures temperature on the back side of the susceptor, so that temperature repeatability is not affected by the deposition process. To further improve temperature uniformity and to minimize slip, RF coupling to the susceptor has been dramatically enhanced by lowering the RF frequency to 25 kHz. The dual chambered EpiPro processes up to 36 150 mm wafers, the largest epitaxial batch size available today, for a 50 percent improvement over competitive equipment. The systems can be installed side by side, allowing for an additional 30 percent throughput per floorspace savings. These features, plus 95 percent or greater uptime, combine to give the EpiPro 5000 the lowest cost of ownership for this equipment class. Mattson Technology Inc., is a multiple product supplier of semiconductor process equipment for photoresist strip/etch, chemical vapor deposition and rapid thermal processing. The company's products combine advanced process technology on a high productivity platform, backed by industry-leading support. Since beginning operations in 1989, the company's core vision has been to help bring technology leadership and productivity gains to semiconductor manufacturers worldwide. Headquartered in Fremont, Calif., the company maintains sales and support centers throughout the United States, Europe, Asia/Pacific and Japan. For more information, please contact Mattson Technology Inc., 3550 W. Warren Avenue, Fremont CA 94538. Telephone: 800/MATTSON. Fax: 510/657-0165. Internet: www.mattson.com ------------------------------------------------------------------ Contact: Mattson Technology Inc. Lindsey Mitobe, 510/492-6334 or The Loomis Group, Inc. Jennifer Joelson, 415/882-9494