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Technology Stocks : Mattson Technology -- Ignore unavailable to you. Want to Upgrade?

To: Ian@SI who wrote (1466)	7/7/1999 8:38:00 PM
From: Ian@SI	Read Replies (1) \| Respond to of 3661

MTSN tool covered by SemiBizNews... semibiznews.com 204.247.196.14 Mattson enhances epi-silicon reactor to serve discrete, bipolar, MOS devices A service of Semiconductor Business News, CMP Media Inc. Story posted 5:30 p.m. EST/2:30 p.m., PST, 7/6/99 FREMONT,Calif. -- During next week's Semicon West trade show in San Francisco, Mattson Technology Inc. plans to introduce a new epitaxy reactor system that deposits a range of silicon film thickness on silicon wafers for discrete, bipolar and MOS devices. The EpiPro expitaxial silicon deposition tool will handle wafer diameters up to 200 mm, and it combines technology, productivity and reliability enhancements based on input from an installed base of 400 epitaxial systems, according to Mattson. "We feel this system has better uniformity than any other batch epi system in the world," said Brad Mattson, CEO of Mattson Technology. He said the design increases throughput while improving epi uniformity. Last August, Mattson Technology moved into the epitaxial equipment market when it acquired Concept Systems Design Inc. of Fremont. The company merged Concept Systems Design with its High-Temperature Processing division to form Concept-HTP to pursue high-temperature front-end-of-line processes in wafer fabs (see story in Sept. 15, 1998, issue of SBN). The EpiPro 5000 has a dual chamber, which enables the epitaxial reactor to process a broad range of silicon thicknesses, from 1 to more than 100 microns, according to the company. The chamber's patented, bell-jar design provides uniform delivery of reactant gases over a large area, Mattson Technology said. An ex situfiberoptic sensor measures temperature on the back side of the susceptor, so that temperature repeatability is not affected by the deposition process, the company said. According to Mattson Technology, RF coupling to the susceptor has been enhanced by lowering the radio-frequency to 25 kHz, which improves the uniformity. The dual-chambered EpiPro processes up to thirty-six 150-mm wafers. Currently, the Fremont company said it has received multiple orders for systems and plans to begin shipping the EpiPro reactors in the third quarter.