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Technology Stocks : Ultratech Stepper -- Ignore unavailable to you. Want to Upgrade?


To: Ram Seetharaman who wrote (3227)7/12/1999 5:20:00 PM
From: Ram Seetharaman  Respond to of 3696
 
Ultratech Enhances Product Portfolio With New Application-specific Family of Reduction Lithography Tools
Business Wire - July 12, 1999 08:43
SAN JOSE, Calif.--(BUSINESS WIRE)--July 12, 1999--

Mercury XLS Family Addresses Resolution Requirements Down to 0.25 Micron

Ultratech Stepper, Inc. (Nasdaq NM:UTEK), a leading supplier of photolithography systems used to manufacture semiconductors, micromachining devices and thin film heads (TFH) for disk drives, today announced the introduction of the Mercury XLS family -- a series of reduction tools designed to address the complete range of application-specific lithography needs for resolution requirements down to 0.25 micron. Based on Ultratech's leading-edge, production-proven 1X product lines, the company now provides a family of new reduction steppers. The Mercury XLS 100, the Mercury XLS 200 and the Mercury XLS 300 will supplement the company's product offerings and will be used in a number of Ultratech's served markets.

With double-digit growth and potential lower unit prices predicted by Dataquest for the semiconductor industry through 2001, the company believes the demand for cost-effective, leading-edge processes, both 1X and reduction, will become more critical. Recent reports from Dataquest suggest that global revenues in this industry will grow to $244 billion by 2003. Not surprisingly, chip manufacturers continue to press for more sophisticated lithography tools with low capital costs. The introduction of the Mercury XLS family is Ultratech's latest response to application-specific integrated circuit demands for more advanced lithography tools.

Commenting on the new product family, Ultratech's president and chief operating officer, Daniel Berry, pointed to the company's record of delivering high-performing, cost-effective lithography systems to the TFH and semiconductor packaging markets. "Our significant share of these markets says much about our ability to meet customers' leading-edge technology needs with higher-resolution tools. The Mercury XLS family now allows us to apply our expertise to new market segments within the semiconductor arena, further extending the range of application-specific, low-capital-cost lithography equipment options available to our customers," stated Berry.

The Mercury XLS reduction systems offer higher-resolution capabilities and complement Ultratech's existing 1X tools. The XLS 100 offers a resolution of 0.5 micron. The XLS 200 offers a resolution of 0.35 micron and the XLS 300 offers a resolution of 0.25 micron. All systems have high precision stages, together with the low-lens distortion required for cost-effective complementary lithography and can be used in conjunction with Ultratech's 1X tools in a mix-and-match configuration.

"Safe Harbor" Statement under the Private Securities Litigation Reform Act of 1995: Certain of the statements contained herein may be considered forward-looking statements that involve risks and uncertainties, such as dependence on new product introductions and commercial success of any new products, risks associated with introducing new technologies, the cyclicality in the thin film head and semiconductor industries, competition, lengthy sales cycles for the company's systems, pricing pressures, the mix of products sold, delays, deferrals and cancellations of orders by customers, manufacturing inefficiencies and absorption levels, ability to volume-produce systems and meet customer requirements, integration and development of the UltraBeam and Verdant operations, inventory obsolescence, adjustments relating to the potential change in accounting for the ISI acquisition, the failure to develop and commercialize the ISI products, delays in collecting accounts receivable, extended payment terms, economic and political conditions in Asia and changes in technologies. Such risks and uncertainties are set forth in the company's SEC reports, including the company's Annual Report on Form 10-K for the period ended December 31, 1998, and its Form 10Q for the period ended March 31, 1999.

About Ultratech: Founded in 1979, Ultratech Stepper, Inc. designs, manufactures and markets photolithography equipment used worldwide in the fabrication of integrated circuits, micromachining devices, thin film heads for disk drives and photomasks for the semiconductor industry. The company produces products that substantially reduce the cost of ownership for manufacturers in the electronics industry. The company's home page on the World Wide Web is located at ultratech.com

CONTACT: Ultratech Stepper, Inc.
Laura Rebouche, 408/321-8835
Fax: 408/577-3379
email: lrebouche@corp.ultratech.com
or
MCA
Jane Evans-Ryan, 650/968-8900
Fax: 650/968-8990
email: jryan@mcapr.com





To: Ram Seetharaman who wrote (3227)7/12/1999 5:22:00 PM
From: Ram Seetharaman  Respond to of 3696
 
Ultratech Unveils Lithography Product for Bump (flip-chip) Process Applications
Business Wire - July 12, 1999 08:45
SAN JOSE, Calif.--(BUSINESS WIRE)--July 12, 1999--

Saturn Spectrum 3 brings front-end lithography technology to advanced consumer packaging applications

Ultratech Stepper, Inc. (Nasdaq NM:UTEK), a leading supplier of photolithography systems used to manufacture semiconductors, micromachining devices and thin film heads (TFH) for disk drives, today announced the introduction of the Saturn Spectrum 3 -- the first lithography tool designed specifically for bump (flip-chip) process applications. The system was developed in collaboration with Casio Computer Co. Ltd., a global leader in the electronic consumer arena and significant user of bump technology. The new wafer stepper marks Ultratech's introduction of advanced technology for semiconductor packaging applications and further expands Ultratech's range of lithography solutions to cost-conscious customers.

"Ultratech once again demonstrates its cost-effective technology leadership in the industry -- this time with a product designed specifically to meet the advanced lithography requirements of bump (flip-chip) process applications," said Daniel Berry, Ultratech's president and chief operating officer. "More importantly, the introduction of the Saturn Spectrum 3 signals an exciting strategic development for our company as we extend our core competency in lithography to advanced semiconductor packaging applications. This product is designed to offer customers a technically-sophisticated solution to their bump (flip-chip) process requirements, with the cost-of-ownership advantages chipmakers require in the face of increasing fab costs."

Commenting on the new Saturn Spectrum 3, Casio's project leader of the Research Center, Takeshi Wakabayashi said, "With our company turning its strategic attention to wafer-level, chip-size packages, it was necessary to seek a partner who could provide advanced lithography technology and expertise together with a reliable global customer support network. Ultratech has a consistent track record of producing high-performing, high-yield tools with the added advantage of low capital costs. We're pleased to select them as our partner in this new endeavor."

Ultratech's alliance with Casio was critical to the successful delivery of the system, according to Berry. "The increasing demand for versatile, high-performing lithography tools requires across-the-board global technology cooperation. Fostering these corporate partnerships has always been a big part of Ultratech's diversification strategy and in this case we have leveraged our combined technical knowledge to generate a tool that we believe meets the advanced requirements for bump (flip-chip) processing applications."

The Saturn Spectrum 3 is a unique wafer stepper that offers flexibility and cost-effective advantages for advanced thick-film lithography applications. This is the first system to utilize Ultratech's new exclusive broadband ghi-line optics technology, and the company believes it is capable of processing any g or i-line photosensitive film from 1.0 micron to more than 100 microns thick on the same stepper. With 2.0-micron resolution and a usable depth-of-focus of greater than 5.0 microns, the system provides a high degree of process latitude. It is equipped with a fully automatic wafer-size change feature that allows back-to-back processing of wafers ranging from four to eight inches in diameter. In addition, its high wafer-plane irradiance results in low exposure times and high throughput at high dose exposures. With its advanced Machine Vision System (MVS), a pattern-recognition-based alignment system, the need for dedicated targets is eliminated and integration with existing processes is simplified.

"Safe Harbor" Statement under the Private Securities Litigation Reform Act of 1995: Certain of the statements contained herein may be considered forward-looking statements that involve risks and uncertainties, such as the cyclicality in the thin film head and semiconductor industries, competition, lengthy sales cycles for the company's systems, pricing pressures, the mix of products sold, delays, deferrals and cancellations of orders by customers, manufacturing inefficiencies and absorption levels, ability to volume-produce systems and meet customer requirements, dependence on new product introductions and commercial success of any new products, integration and development of the UltraBeam and Verdant operations, risks associated with introducing new technologies, inventory obsolescence, adjustments relating to the potential change in accounting for the ISI acquisition, the failure to develop and commercialize the ISI products, delays in collecting accounts receivable, extended payment terms, economic and political conditions in Asia and changes in technologies. Such risks and uncertainties are set forth in the company's SEC reports, including the company's Annual Report on Form 10-K for the period ended December 31, 1998, and its Form 10Q for the period ended March 31, 1999.

About Ultratech: Founded in 1979, Ultratech Stepper, Inc. designs, manufactures and markets photolithography equipment used worldwide in the fabrication of integrated circuits, micromachining devices, thin film heads for disk drives and photomasks for the semiconductor industry. The company produces products that substantially reduce the cost of ownership for manufacturers in the electronics industry. The company's home page on the World Wide Web is located at ultratech.com

CONTACT: Ultratech Stepper, Inc.
Laura Rebouche, 408/321-8835
Fax: 408/577-3379
email: lrebouche@corp.ultratech.com
or
MCA
Jane Evans-Ryan, 650/968-8900
Fax: 650/968-8990
email: jryan@mcapr.com




To: Ram Seetharaman who wrote (3227)7/12/1999 5:24:00 PM
From: Ram Seetharaman  Read Replies (1) | Respond to of 3696
 
Ultratech Introduces New Breakthrough Broadband Stepper Lens; 1X lens designed for the full range of Ultratech's served markets
Business Wire - July 12, 1999 08:44
SAN JOSE, Calif.--(BUSINESS WIRE)--July 12, 1999--Ultratech Stepper, Inc. (Nasdaq NM:UTEK), a leading supplier of photolithography systems used to manufacture semiconductors, micromachining devices and thin film heads (TFH) for disk drives, today announced the introduction of a breakthrough broadband 1X stepper lens. The new lens -- the first of its kind capable of exposing both g-line and i-line photosensitive films on the same stepper -- is designed to meet the varied lithography needs for a number of Ultratech's served markets.

Heightened demand for a versatile system fueled the development of Ultratech's latest stepper lens which will be featured at SEMICON West 99. Key to the success of the lens is its utilization of Ultratech's 1X technology that will broaden the process development capabilities and manufacturing options in these arenas, while reducing overall costs.

The combination of the g-line and i-line spectrums in a single lens offers customers a practical and cost-effective alternative to their resist processing requirements, according to Ultratech's president and chief operating officer, Daniel Berry. "Until recently, customers were forced to chose between one spectrum or the other in their efforts to contain escalating equipment costs. The resultant lack of process flexibility caused chipmakers to seek a more efficient tool that could accommodate multiple processes. The new Ultratech exclusive broadband lens eliminates this difficult trade-off by providing the flexibility to run both thick g-line and thin i-line resist processes on the same stepper," stated Berry.

Among the unique features of the lens is a high wafer plane irradiance that results in low exposure time and increased throughput at high dose exposures. In addition, the lens design has multiple field-size configuration options -- 44 mm x 22 mm for mix-and-match with Ultratech's reduction steppers, 34 mm x 26 mm for mix-and-match with new step-and-scan photolithography tools, and 50 mm x 25 mm for very large exposure area applications. The lens also offers an elevated degree of process latitude with 2.0-micron resolution and more than 5.0-micron usable depth of focus.

"Safe Harbor" Statement under the Private Securities Litigation Reform Act of 1995: Certain of the statements contained herein may be considered forward-looking statements that involve risks and uncertainties, such as the dependence on new product introductions and commercial success of any new products, risks associated with introducing new technologies, the cyclicality in the thin film head and semiconductor industries, thin film head competition, lengthy sales cycles for the company's systems, pricing pressures, the mix of products sold, delays, deferrals and cancellations of orders by customers, manufacturing inefficiencies and absorption levels, ability to volume-produce systems and meet customer requirements, integration and development of the UltraBeam and Verdant operations, inventory obsolescence, adjustments relating to the potential change in accounting for the ISI acquisition, the failure to develop and commercialize the ISI products, delays in collecting accounts receivable, extended payment terms, economic and political conditions in Asia and changes in technologies. Such risks and uncertainties are set forth in the company's SEC reports, including the company's Annual Report on Form 10-K for the period ended December 31, 1998, and its Form 10Q for the period ended March 31, 1999.

About Ultratech: Founded in 1979, Ultratech Stepper, Inc. designs, manufactures and markets photolithography equipment used worldwide in the fabrication of integrated circuits, micromachining devices, thin film heads for disk drives and photomasks for the semiconductor industry. The company produces products that substantially reduce the cost of ownership for manufacturers in the electronics industry. The company's home page on the World Wide Web is located at ultratech.com

CONTACT: Ultratech Stepper, Inc.
Laura Rebouche, 408/321-8835
Fax: 408/577-3379
email: lrebouche@corp.ultratech.com
or
MCA
Jane Evans-Ryan, 650/968-8900
Fax: 650/968-8990
email: jryan@mcapr.com