To: Ian@SI who wrote (1487 ) 7/12/1999 3:12:00 PM From: Ian@SI Read Replies (2) | Respond to of 3661
The RTP announcement including the statement that multiple orders have already been shipped to customers... Ian. ++++++++++ Monday July 12, 8:29 am Eastern Time Company Press Release Mattson Technology Debuts Next-Generation RTP System At SEMICON West 99 FREMONT, Calif.--(BUSINESS WIRE)--July 12, 1999--Mattson Technology Inc. (Nasdaq:MTSN - news), a global supplier of advanced process equipment used to manufacture semiconductors, today introduced its next-generation rapid thermal processing system, the Aspen RTPFR3, at SEMICON West 99. The new system unites the innovative technology, productivity and reliability enhancements obtained from joint development work with key customers over the past 18 months. Based on the Aspen II platform, the Aspen RTPFR3 is designed to meet the requirements for advanced sub 0.18 micron processing and at the same time, satisfy the demands of high volume manufacturing. Multiple orders have already been shipped to customers and are running in production. Mattson is a key exhibitor at SEMICON West 99, held July 12-14 at San Francisco's Moscone Center, South Hall, Booth No. 218. Aspen RTPFR3 is based on Mattson's proprietary susceptor technology, which combines the tight process control of single wafer rapid thermal processing (RTP) systems with the high throughput and low cost-of-ownership of batch furnaces. In addition, the robust system design allows Mattson to offer an all inclusive three-year warranty that covers all consumables and maintenance costs -- a major expense with lamp-based RTP systems. The Aspen RTPFR3 has been designed to provide the lowest overall cost of ownership for this class of equipment. Aspen RTPFR3 has the unique capability to process over a wide temperature range (from 300oC to 1200oC) and to handle both traditional RTP and many furnace applications. The system provides a full suite of leading edge applications that include silicides, TiSi2 or CoSi2; implant anneals, ultra-shallow junctions without ''spike anneals''; high k dielectric anneals (Ta2O5, BST, SBT); glass reflow and/or densification (BPSG, PSG); curing of low k films; and low-temperature copper anneal. Currently, no other RTP or furnace system in the industry provides as accurate control of temperature over such a wide range. Aspen RTPFR3 moves seamlessly from high temperature implant anneals to low temperature copper anneals to lengthier high k processes that last up to several minutes. Enhancements to the system include improved thermal isolation to keep the wafer temperature uniformity independent of the process temperature. Excellent uniformity can be achieved over a wide range of process temperatures for both long and short process times. Proprietary wafer handling techniques are used to remove wafer from the chamber at process temperature, eliminating the cool-down time required by other systems. For excellent wafer-to-wafer repeatability, an advanced temperature control system maintains a stable thermal environment at all times, regardless of intrinsic wafer parameters. After processing, the system can also perform in situ chamber cleaning using a patented MTS Clean(TM) without operator intervention. Brad Mattson, CEO and Chairman of Mattson Technology, said, ''The extra time we spent working closely with our customers on these enhancements really helped us to develop a product that meets their needs. I think we've come up with a 'no compromises' RTP solution that's worthy of our reputation for innovative technology and productivity leadership.'' About Mattson Technology Inc. Mattson Technology Inc., is a multiple product supplier of semiconductor process equipment for photoresist strip/etch, chemical vapor deposition, rapid thermal and epitaxial processing. The company's products combine advanced process technology on a high productivity platform, backed by industry-leading support. Since beginning operations in 1989, the company's core vision has been to help bring technology leadership and productivity gains to semiconductor manufacturers worldwide. Headquartered in Fremont, the company maintains sales and support centers throughout the United States, Europe, Asia/Pacific and Japan. For more information, please contact Mattson Technology Inc., 3550 W. Warren Avenue, Fremont, Calif. 94538. Telephone: 800/MATTSON. Fax: 510/657-0165. Internet: www.mattson.com. Note to Editors: MTS Clean(TM) trademark pending, Mattson Technology Inc., 1999 -------------------------------------------------------------------------------- Contact: Mattson Technology Lindsey Mitobe, 510/492-6334 lmitobe@mattson.com or