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Politics : Formerly About Advanced Micro Devices -- Ignore unavailable to you. Want to Upgrade?

To: Shane Geary who wrote (67037)	7/30/1999 1:52:00 PM
From: Elmer	Respond to of 1587095

Re: "Actually, it is an "effective" channel length because the source and drain areas encroach underneath the gate (due to dopant diffusion and usually 45 degree implants) and is thus smaller than the drawn gate length (not the drawn "channel" length). It's not because of how it is indirectly measured electrically ." One of the main uses of leff is it gives companies with inferior process technology a way to describe their process in a better light. Top notch companies will describe their process by the drawn channel length i.e. .25u while a less leading edge company would quote their leff number. Makes them look better. Neither AMD or Intel do this. In fact Intel's .25u process is really a .20u process at FCCD, from what I hear. EP