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To: ScotMcI who wrote (22873)	8/12/1999 3:22:00 PM
From: TI2, TechInvestorToo	Read Replies (1) \| Respond to of 25960

What is his track record for selling? It is common for insiders with incentive options ( and SEC trading restrictions) to sell on a somewhat regular basis for investment diversification reasons and to avoid share holder lawsuits. It also helps to pay the tax bill associated with those gains. What he sold is a minority portion of holdings- maybe he is building a new house- which he deserves :-) TI2

To: ScotMcI who wrote (22873)	8/12/1999 4:37:00 PM
From: BillyG	Read Replies (1) \| Respond to of 25960

Etec to advance mask-pattern technology under $14.2 million DARPA contract A service of Semiconductor Business News, CMP Media Inc. Story posted 9 a.m. EST/6 a.m., PST, 8/12/99 HAYWARD, Calif--Etec Systems Inc. here today announced it has received a $14.2 million contract from the U.S. Defense Advanced Research Projects Agency for research into lithography and other military-semiconductor manufacturing and microelectronics technologies. Under the contract, which is through the Space and Naval Warfare Systems Center, Etec will conduct advanced research into microcolumn and multi-source electron-beam technology for advanced semiconductor manufacturing and mask patterning and wafer direct write. The award is part of a three-year, cost-sharing agreement expected to total $28 million. "The award is a recognition of the progress Etec has already made in this area," said Mark Gesley, vice president of technology development at Etec. "This added funding supports our goal of demonstrating feasibility for multi-electron-beam patterning for future device generations." Etec will work with several other companies, such as Shipley Co., a photoresist and chemicals supplier in Marlborough, Mass., as well as Oregon Graduate Institute, Stanford University, the Naval Research Lab, and the University of Texas. Microcolumns are miniature versions of the much larger electron-beam columns on Etec's advanced mask-pattern-generation systems, which can handle 0.18-micron mask production and early 0.13-micron mask development. By employing microcolumns in arrays and by employing multiple sources, Etec believes it could vastly improve throughput at sub-100-nm design rules. "Simply put, this would be like painting an area with a wide brush rather than a single sharp pencil," Gesley said. "The longer write times required for today's small mask geometries and future device rules have contributed to higher overall mask costs. This development work could be a very positive step toward lowering the costs of masks for the semiconductor industry."