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Politics : Formerly About Advanced Micro Devices -- Ignore unavailable to you. Want to Upgrade?

To: Tenchusatsu who wrote (68728)	8/13/1999 2:14:00 PM
From: Paul Engel	Read Replies (1) \| Respond to of 1585203

Ten - re: "How do you mix a 0.18 micron process with a 0.25 micron process?" I am assuming that AMD is using FRONT END PROCESSING from Raw Silicon up to the (first) Contact Mask taken from the 0.18 micron process (spacing excepted - see below) - using the various threshold adjusting implants and Vt's and gate oxide thickness and polysilicon gate linewidths developed for the 0.18 micron process. The SPACING of the transisitors (i.e., the density) conforms to the 0.25 micron design rules - as the BACK END Metallization/Contacts/Vias/and intermetal dielectrics are taken from the 0.25 micron process. Paul