To: Dave Kahn who wrote (3336 ) 11/17/1999 10:49:00 AM From: Ian@SI Respond to of 3696
Looks like the first sale from the ISI acquisition...msnbc.com Wednesday November 17, 8:32 am Eastern Time Company Press Release Ultratech Wins First Order for New 157 nm Microstepper From a Major Japanese Semiconductor Consortium New-generation Stepper Will be Used as an R&D Tool for Resist and Materials Characterization SAN JOSE, Calif.--(BUSINESS WIRE)--Nov. 17, 1999-- Ultratech Stepper, Inc. (Nasdaq NM: UTEK - news), a leading supplier of photolithography systems used to manufacture semiconductors, micromachined devices and thin film heads (TFH) for disk drives, today received an order for its first 157 nm microstepper to a major Japanese semiconductor consortium. This order, the result of a competitive bid, firmly positions Ultratech as an important player in providing next-generation lithography tools and increases the company's presence in the Asia Pacific market arena. Delivery of the system, which will be utilized as a research and development (R&D) tool, is expected to occur in the second quarter of 2000. With the drive toward higher resolution continuing to shape the landscape of technology development, the lithography industry is grappling with the technical hurdles associated with the advancement of e-beam (Scalpel) and extreme ultraviolet (EUV) technologies. Alternative solutions are becoming increasingly necessary in order to keep pace with shrinking device geometries. Building on the large successful installed base of Ultratech's 193 nm stepper, the company believes that its 157 nm system will become the tool of choice for material science research and device testing. ``The introduction and first sale of this new tool is a significant accomplishment for our company,' said Ultratech's Chairman and Chief Executive Officer Art Zafiropoulo. ``We have always placed a high priority on developing advanced R&D tools, and we consider such efforts to be an important part of our contribution to the advancement of the global lithography industry. The 157 nm microstepper is expected to have a resolution capability of 0.10 submicron features, offering a viable new alternative to the industry as it awaits the arrival of Scalpel and EUV technologies.' Ultratech believes it was selected by the customer for its expertise in developing tools for special advanced requirement utilization, and for its strong after-sales support capabilities in Japan. According to Ultratech's President and Chief Operating Officer Dan Berry, ``During the past decade, Ultratech Stepper has achieved notable success in the Japanese market due to its cost-effective lithography solutions and exceptional customer support.' Visit Ultratech's Booth No. 3-A801 at SEMICON Japan to learn more about the 157 nm microstepper and the company's other exciting products and technologies.