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Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?

To: Darryl Olson who wrote (23610)	11/17/1999 11:40:00 AM
From: Proud_Infidel	Read Replies (1) \| Respond to of 25960

Wednesday November 17, 11:00 am Eastern Time Company Press Release SOURCE: Cymer, Inc. Order for Cymer's New 157 nm F2 Laser for Next-Generation Lithography Process Development Placed by Ultratech Stepper ELX-6500F2 Is Industry's First 1000 Hz Fluorine (F2) Laser For 157 nm Lithography SAN DIEGO, Nov. 17 /PRNewswire/ -- Cymer, Inc. (Nasdaq: CYMI - news), the world's leading supplier of illumination sources essential for deep ultraviolet (DUV) photolithography, today announced it has received an order from Ultratech Stepper, Inc., San Jose, Calif., for its new ELX-6500F2 fluorine laser. As line widths continue to shrink with each successive generation of integrated circuits (ICs), lithography light sources have become increasingly critical to chipmakers in maintaining their competitive edge. Cymer's new fluorine F2 laser -- the industry's first 157 nm laser to offer a 1000 Hz repetition rate -- enables the extension of optical lithography for devices with feature sizes below 100 nm. The ELX-6500F2 will be integrated into an Ultratech small field microstepper lithography tool, the XLS 157 nm microstepper, for next- generation lithography process development applications. The laser is slated to ship to Ultratech's Wilmington, Mass. facility during the first quarter of 2000. According to Kevin Zollinger, vice president and general manager of Ultratech's Wilmington, Mass. facility, Ultratech selected Cymer over competing laser suppliers based on a number of criteria. ''Given the advanced nature of our XLS 157 nm microstepper, we needed a state-of-the-art laser system designed to meet not only our advanced technical requirements but also to offer the high repetition rate needed for short exposures -- ultimately leading to greater stepper productivity.'' According to Pascal Didier, Cymer's senior vice president of worldwide customer operations, Ultratech selected Cymer as its primary 157 nm light source supplier based on Cymer's scientific and technology leadership in providing advanced light source solutions at four wavelengths. ''Cymer's F2 laser demonstrates our commitment to participate in the extension of optical lithography for the production of next-generation devices. As chipmakers drive below the 0.10 micron (100 nm) node, they will need state-of-the-art lithography tools with more advanced and powerful laser illumination sources to image the tighter critical dimensions at shorter wavelengths.'' The ELX-6500F2 fluorine laser incorporates Cymer's innovative new 157 nm dosimeter, used as an internal energy monitor, which allows the ELX-6500F2 to operate with unparalleled dose stability. The ELX-6500F2 is built upon Cymer's industry-proven excimer laser technology at both 248 nm (KrF) and 193 nm (ArF). Based on the ELS-6000(TM) platform, the ELX-6500F2 also features the modularity and latest technology advancements that are designed to further Cymer's leading position as the industry's most comprehensive provider of advanced light source solutions. Cymer, Inc. is the leading provider of excimer laser illumination sources, the essential light source for deep ultraviolet (DUV) photolithography systems. DUV lithography is a key enabling technology, which has allowed the semiconductor industry to meet the exact specifications and manufacturing requirements for volume production of today's advanced semiconductor chips. Further information on Cymer may be obtained from the company's SEC filings, on the Internet at cymer.com or by contacting the company directly. SOURCE: Cymer, Inc.