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Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?

To: ScotMcI who wrote (23755)	12/13/1999 12:22:00 PM
From: ScotMcI	Read Replies (1) \| Respond to of 25960

Cymer Product Roadmap Validated at the Cymer Seiko Instruments Inc. Seventh Annual Lithography Symposium Latest Advances in the Lithography Arena Revealed SAN DIEGO, Dec. 13 /PRNewswire/ -- Cymer, Inc. (Nasdaq: CYMI), the world's leading supplier of illumination sources essential for deep ultraviolet (DUV) photolithography, today announced that its new product roadmap was recently validated at its annual lithography symposium, co-hosted by Cymer's key manufacturing partner, Seiko Instruments Inc., and held in conjunction with SEMICON Japan. For the past seven years, Cymer has brought together the industry's top DUV lithography tool suppliers and world's leading chipmakers to discuss the upcoming challenges and trends confronting the semiconductor industry. "An important outcome of this year's symposium was that both the chipmakers' and lithography tool manufacturers' presentations showed a strong alignment between their future product requirements and Cymer's technology roadmap," noted Bob Akins, chief executive officer and president of Cymer. "We were extremely pleased to have over 150 people -- primarily from the chipmaker side -- attend this year's event. The increase in participation, along with the excellent attendance by our customers and key chipmakers, signifies the importance of ongoing communications and similar events within the lithography community to assure the industry roadmap is met." This year's symposium entitled, "Lithography Challenges at Four Wavelengths" included presentations from ASML, Canon, FINLE, Fujitsu, Intel, NEC, Nikon, Selete and SVGL, as well as Cymer's key executives and world-renowned scientists. Krypton Fluoride (KrF) at 248 nm was the first wavelength topic discussed during the "Productivity Needs for Lithography Tools" segment. Following this, a presentation on "Issues and Timing for Transition to ArF 193 nm Lithography" addressed the challenges faced by the industry as it moves into the second DUV wavelength arena. Cymer's Chief Technical Officer and co-founder, Dr. Richard Sandstrom, presented the company's latest light source developments at the third wavelength with his 157 nm F2 presentation. In a related topic, during SEMI's new technical program on emerging technologies at SEMICON Japan, Gerry Blumenstock of Cymer also presented "F2 Laser for VUV Microlithography." "Prospects for a Novel EUV Light Source," presented by Dr. Igor Fomenkov, unveiled Cymer's recent progress in the fourth wavelength with its non-laser-based approach to next-generation lithography. Cymer, Inc. is the leading provider of excimer laser illumination sources, the essential light source for deep ultraviolet (DUV) photolithography systems. DUV lithography is a key enabling technology, which has allowed the semiconductor industry to meet the exact specifications and manufacturing requirements for volume production of today's advanced semiconductor chips. Further information on Cymer may be obtained from the company's SEC filings, on the Internet at cymer.com or by contacting the company directly. SOURCE Cymer, Inc.