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To: ScotMcI who wrote (23994)	1/17/2000 6:32:00 PM
From: Andrew Vance	Respond to of 25960

No it has not. I would expect that direct write e-beam will be the way things go but the advanced lasers are getting so small, I wouldn't rule it out as a possibility. To be honest the DUV should have been EUV, and even that is a push. Admittedly I might be pushing the window here since I am making some unfair assumptions. I saw a 0.10u or less beam size for a MEBES system being equated with the work at UT Austin that created 0.08u features. Could there be an overlap for awhile? I won't rule it out but maybe I should just back off and say direct write e-beam and play it safe. Then again, I never have played it safe in lithography when I was an Engineer<gg>. AV