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To: Steve Lee who wrote (97176)	1/22/2000 5:59:00 PM
From: Process Boy	Read Replies (1) \| Respond to of 186894

Steve - <I think it was you that commented on some kind of new CuMine manf. process - "notched process" or something like that. This was a breakthrough that transformed a yield problem into a new unexpected way of making more chips cheaper. Are you able to elaborate or did this come from somewhere else? Thanks.> The notched poly feature allows for smaller Leff while utilizing current generation lithography equipment. I.e., the top down dimension is ~130nm, the dimension at the gate is ~100nm. Other improvements to device characteristics are noted. eet.com There used to be an article at Semiconductor-intl.com that had a beautiful picture of a P858 notched gate in cross section (SEM), but the page has evidently been removed. PB