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Politics : Formerly About Advanced Micro Devices -- Ignore unavailable to you. Want to Upgrade?

To: Dan3 who wrote (89290)	1/25/2000 12:15:00 AM
From: Paul Engel	Respond to of 1572561

AlibiDan - re: "Will the manufacturing equipment that Intel is moving into its FABs throughout the year support the same 50nm gate size supported by AMD's new equipment? " No. As far as I know, there is currently NO PHOTOLITHOGRAPHY equipment that is commercially available for printing CDs (Critical Dimensions) below about 0.10 micron in a production environment on 8 inch wafers. Most "attempts" at making sub 0.10 micron gates utilize developing and/or etching "tricks" to make the final CDs below about 0.10 microns, even though the image is actually "printed" at a larger size - due to restrictions in currently available photolithography equipment. Note: Although feature SIZES can be made smaller this way, the distance between features (PITCH) CAN NOT. The photolithography equipment limitations still govern the circuit DENSITY. Paul