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To: Brian Malloy who wrote (24198)	2/7/2000 9:34:00 AM
From: TechHunter	Respond to of 25960

Our Light Source? Monday February 7, 9:03 am Eastern Time Company Press Release Samsung Selects SVG's Very High NA ArF Lithography Tool SAN JOSE, Calif.--(BUSINESS WIRE)--Feb. 7, 2000--Confidence in Silicon Valley Group's (Nasdaq:SVGI - news) very high numerical aperture (VHNA) program grew significantly today with the announcement that Samsung will take delivery of a Micrascan VHNA ArF Step and Scan Lithography System for their 100 nm node. This commitment follows breakthrough performance results for SVG's ArF program. The tool's flexibility and ability to address advanced and sub-critical layers, as well as high productivity drove the decision. ``Samsung has been using our tools for years, beginning with the 248 nm system,' commented John Shamaly, president of SVG Lithography Systems. ``This is an extension of our long-time relationship with Samsung, and we are pleased with the confidence they have shown in SVG's cutting-edge tool performance.' The Micrascan 193 VHNA system is a bridge tool, supporting both 200 mm and 300 mm wafer processing. Its newly designed platform and superior technical performance will greatly assist customers in satisfying requirements for the 130 nm and 100 nm nodes.