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To: lrrp who wrote (2658)	2/14/2000 9:29:00 PM
From: John Stewart	Respond to of 3661

Steve; I think the low "k" CVD application Brad described in the recent conference call is the next generation from here. I thought they were doing FSG already. Best Regards, John Stewart

To: lrrp who wrote (2658)	2/15/2000 12:11:00 PM
From: Q.	Read Replies (1) \| Respond to of 3661

in CVD, the term "high density" refers to a type of plasma source that is used. Mattson uses an inductively-coupled plasma source, which is the same kind of high density plasma source used by Novellus and Applied Materials. In this type of source, you have an antenna located just outside the vacuum chamber, and the antenna is powered by radio frequency voltages, causing the gas inside the vacuum chamber to become ionized, i.e., to become a plasma. The differences in the way various manufacturers design such a plasma source are generally minor, for example the shape of the antenna varies from one tool manufacturer to another. I believe that the primary feature distinguishing Mattson's tools, whether for CVD or strip, is the vacuum chamber configuration, not the plasma source. Another distinguishing factor is price. Mattson's tools have a lower ASP, which is a reason that price-sensitive customers like DRAM and foundries are attracted to MTSN.