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Politics : Formerly About Applied Materials -- Ignore unavailable to you. Want to Upgrade?

To: Jeffrey D who wrote (34314)	2/17/2000 2:55:00 PM
From: Proud_Infidel	Read Replies (1) \| Respond to of 70976

I don't think the eps estimates from ABN Amro were posted nor the CIBC/Opp comments: 2/16/00 Abn Amro reiterates buy raised target from $160 to $250, raised FY 00 estimates from $3.80 to $4.30 and 01 estimates from $6.00 to $7.80 2/16/00 CIBC/Oppenheimer reiterates strong buy raise price target to $220, outstanding qtr **************************** BTW, 35 times '01 eps of $7.80 is $273.

To: Jeffrey D who wrote (34314)	2/17/2000 5:38:00 PM
From: Proud_Infidel	Respond to of 70976

AKT's flat panel CVD system processes larger glass substrates Semiconductor Business News (02/17/00, 11:56:44 AM EDT) SANTA CLARA, Calif. -- A new-generation chemical vapor deposition (CVD) system announced today by AKT Inc. here is designed to reduce the unit cost of flat-panel display (FPD) manufacturing by enabling the processing of larger glass substrates. The AKT 5500 deposits semiconducting and insulating films used in creating the transistor structures (switches) that control the pixels of thin-film transistor (TFT) active-matrix liquid crystal displays (AMLCDs). With a substrate size capability of approximately 700-mm-x-900-mm, the AKT 5500 can process about 50% more 15-inch flat panel displays and 100% more 17-21 inch displays than the previous generation of systems. "Our new AKT 5500 system provides cost-effective CVD capability that will enable display makers to quickly implement the large substrate sizes needed to meet the accelerating demand for affordable FPD desktop monitors and high-end notebook PCs," said Kam Law, president of AKT, which is a subsidiary of Applied Materials Inc. According to DisplaySearch, a market research firm in Austin, Tex., the overall market for TFT-AMLCD displays is expected to be $12.9 billion in 1999, growing to $36.7 billion by 2003. In addition to processing larger substrates, the new AKT 5500 system incorporates a number of enhancements to its process chambers and substrate handling components. For example, the system's central platform has been expanded to accommodate five process chambers, rather than four as in the previous system. This enables higher system throughput for increased customer productivity. Substrate temperature uniformity has been optimized through new heating modules in the pre-heat and process chambers, and a modified chamber design further improves deposition uniformity. Other new features enhance the system's reliability, particle control and process performance. These include a second-generation remote plasma clean technology for periodic process chamber cleaning to improve deposition repeatability and further increase hardware lifetime and reliability. AKT said it has multiple commitments for the new AKT 5500 CVD system from customers in Japan, Korea and Taiwan that are scheduled for delivery throughout 2000. The system has already begun shipping to customers building display manufacturing facilities that use the largest class of substrates available.