To: Andrew Vance who wrote (1175 ) 2/22/2000 6:57:00 AM From: Qualified Opinion Respond to of 1305
I expect SVGL's new VHNA 193 nm litho. tool is cost efficient with high throughput Samsung is interested. Samsung Selects SVG's Very High NA ArF Lithography Tool SAN JOSE, Calif.--(BUSINESS WIRE)--Feb. 7, 2000--Confidence in Silicon Valley Group's (Nasdaq:SVGI - news) very high numerical aperture (VHNA) program grew significantly today with the announcement that Samsung will take delivery of a Micrascan VHNA ArF Step and Scan Lithography System for their 100 nm node. This commitment follows breakthrough performance results for SVG's ArF program. The tool's flexibility and ability to address advanced and sub-critical layers, as well as high productivity drove the decision. ``Samsung has been using our tools for years, beginning with the 248 nm system,' commented John Shamaly, president of SVG Lithography Systems. ``This is an extension of our long-time relationship with Samsung, and we are pleased with the confidence they have shown in SVG's cutting-edge tool performance.' The Micrascan 193 VHNA system is a bridge tool, supporting both 200 mm and 300 mm wafer processing. Its newly designed platform and superior technical performance will greatly assist customers in satisfying requirements for the 130 nm and 100 nm nodes. About Silicon Valley Group Silicon Valley Group (Nasdaq:SVGI - news) is a leading manufacturer of automated wafer processing equipment for the worldwide semiconductor industry. The company designs, manufactures and markets technically sophisticated equipment used in the primary stages of semiconductor manufacturing. Its products include photolithography exposure tools; photoresist processing equipment; oxidation, diffusion and low-pressure chemical vapor deposition processing systems; atmospheric pressure chemical vapor deposition systems and precision optical components and systems. For more information, visit svg.com . Forward-looking Statement Disclaimer: The matters discussed in this news release, and in particular statements made by the President of SVG Lithography Systems, include forward-looking statements that involve risks and uncertainties including but not limited to difficulties encountered or the benefits derived from customers using the 193 nm high numerical aperture tool. For a complete review of the risks facing the Company, including economic conditions, industry conditions, trade environment and other risks, reference is made to the Company's filings with the Securities and Exchange Commission. Particular reference is made to the Company's most recent Forms 10-K and 10-Q, which detail such risk factors. -------------------------------------------------------------------------------- Contact: Silicon Valley Group Inc. Werner Rust, 408/467-5949 rustw@svg.com Nancy Szymanski, 408/467-5870 szymansn@svg.com or Mathews & Clark Stewart Chalmers, 650/815-1006 schalmers@mathewsandclark.com