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Technology Stocks : Dupont Photomasks (DPMI) -- Ignore unavailable to you. Want to Upgrade?

To: Ian@SI who wrote (939)2/22/2000 10:16:00 PM
From: Duane L. Olson  Respond to of 955
 
True, Ian, Katherine could get us in focus rather quickly, but I think yours is an excellent assessment on the 50 nanometer work.
Of course we wouldn not imply than anyone should take this research work as anything like a near-term prospect for features on that scale....any more than was done when UT and DPMI did that earlier work at .8 micron. But when we are in a lengthy process to .18 micron, and .13 beyond that, it should be comforting to know what can be done with OPC and PSM to permit an extension of "standard" lithography techniques, perhaps well into the next decade.
Where's this market heading?
tso



To: Ian@SI who wrote (939)2/23/2000 9:35:00 AM
From: Katherine Derbyshire  Read Replies (1) | Respond to of 955
 
Re: 50 nm gates, I'm still working on my own article (probably up later this AM), since I'm including a few more technical details than the SBN folks. The technique looks viable for manufacturing, but there's a lot of work yet to do.

Two important points: if the technique works at 50nm, it works even better at 100 nm. And the same masking technique could be used for 193 nm litho, too.

Katherine


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