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To: Ian@SI who wrote (942)2/23/2000 2:37:00 PM
From: FJB  Respond to of 955
 
I believe the MIT 0.05 micron gate was the result of a double exposure technique similar to the one described here:
usa.canon.com

It would be nice to know how this compares to conventional exposure techniques from a cost perspective. Througput is reduced by 40%, so it may still be cost competitive vs. NGL alternatives.