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Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?

To: Curlton Latts who wrote (24331)	2/24/2000 8:06:00 PM
From: Tsaen Wang	Read Replies (1) \| Respond to of 25960

Maybe this explain the after market activities, but we aren't suppose to be in the known any way. Canon revs up throughput of 248-nm scanner for 0.15-micron ICs 204.247.196.14

To: Curlton Latts who wrote (24331)	2/24/2000 11:59:00 PM
From: Dale Knipschield	Read Replies (1) \| Respond to of 25960

Curly, <Sittin is the key. Sittin tight.> Or buying more CYMI....especially at these discounted prices. Check out the following article. (Sorry if its been posted before.) edtn.com We've had some posts here suggesting that LP has been making some inroads (Heaven forbid!) into CYMER's territory, selling a handful or so of lasers. My viewpoint is that competition is probably good for everyone, although it may reduce margins somewhat. However, based upon articles such as the above, IMO, laser demand is increasing to the point that we are looking at a win-win situation for all players, ESPECIALLY CYMER. And I doubt if ASP's will come DOWN in a surging equipment market like this. Adding to CYMI in the mid 50's....... Regards, Knip

To: Curlton Latts who wrote (24331)	2/25/2000 10:55:00 AM
From: BillyG	Respond to of 25960

Corning, Photronics to develop next-generation photoblanks semibiznews.com Semiconductor Business News (02/24/00, 03:46:54 PM EDT) CORNING, N.Y.--Corning Inc. and Photronics Inc. have entered into a two-year development agreement to create next-generation photoblanks for photolithography steps in wafer fabs. "The technology we are developing will allow semiconductor manufacturers to make a new generation of faster and more versatile chips," said Randall D. Price, executive vice president at Corning Advanced Materials. "In particular, they will enable manufacturers to use shorter wavelengths of ultraviolet light, called Deep UV, to etch more intricate circuits onto silicon wafers." Corning and Photronics estimate that the photoblank market will grow from $400 million today to $700 million by 2003. Corning entered the photomask business last November with the introduction of HPFS glass substrates, which are processed into photoblanks. The two companies estimate that the photomask market will grow from about $2 billion today to approximately $4 billion by 2003. "Meeting the need for such short wavelength lithography requires a combination of advancedequipment, process technology, and new materials," said Steve Carlson, vice president of technology at Photronics, a manufacturing of photomasks. "It's the only way to reach the desired levels of circuit-pattern density and fidelity. Our association with Corning will allow us to significantly add to the performance of our Sub-Wavelength Reticle Solutions photomask product families," he added.

To: Curlton Latts who wrote (24331)	2/25/2000 10:56:00 AM
From: BillyG	Respond to of 25960

IBM to disclose details of new photoresist for 0.10-micron processing semibiznews.com By Jack Robertson Semiconductor Business News (02/25/00, 10:13:04 AM EDT) EAST FISHKILL, N.Y. -- IBM Corp.'s Microelectronics Division will tell the SPIE Microlithography Conference next week in Santa Clara, Calif. that it has licensed JSR Inc. of Japan to produce a new photoresist capable of taking 248-nanometer exposure tools down to 0.10-micron processing. George Gombo, manager of lithography at East Fishkill, said the Japanese firm is expected to have the new resist on the market in the first half of this year. He said IBM is already using the material extensively in its own chip operations. The new resist uses bilayer imaging to extend the range of krypton fluoride (KrF) 248-nm tools. Gombo said it is a silicon-containing resist with high etch resistive and anti-reflective coating. He said the extreme 0.10-micron processing is for application-specific circuits, but can be used for both memory and logic chips. IBM will also provide more details at the SPIE meeting on its custom optics system that is part of the cooperative development with Nikon Inc. for a next-generation electron beam projection lithography system. Gombo said the new high-emissive optic system has a large numerical aperture (NA) up to 0.7 and supports a large area exposure for greater tool throughput. A second paper will describe the projection reduction exposure technique using variable immersive lenses. Gombo said this corrects a problem of electron-beam exposure systems in which the electron beam width passing through the mask is sometimes degraded by electron repulsion. The IBM optics minimize the electron interaction with the mask and allow undistorted exposure on the wafer. IBM will also provide the first details of e-beam mask developments coming from its joint venture with Photronics Inc. (see July 12, 1999 story). Gombo said initial research results on both membrane and stencil masks will be presented. More about the Canon 248nm scanner.... semibiznews.com