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Strategies & Market Trends : Cents and Sensibility - Kimberly and Friends' Consortium -- Ignore unavailable to you. Want to Upgrade?

To: KevinMark who wrote (81183)	3/1/2000 6:04:00 PM
From: 2MAR$	Read Replies (1) \| Respond to of 108040

Now dropping a bit, waiting to reload in a $1 less

To: KevinMark who wrote (81183)	3/1/2000 9:48:00 PM
From: SKARLOEY	Read Replies (1) \| Respond to of 108040

JMAR supposedly their top scientist is presenting at a conference 5pm pac time tonight, hopefully some news will come out of this. i am holding long term ,this company will be rockin when news from it's divisions materialize. hopefully most of the dt have left and longer term ppl holding, very possible could test the new resistance for awhile tomorrow, but i think buyers will be back in soon for the next leg up... info below from sept, before JMAR hired him away, gives everyone an idea that this is a very smart guy they have working for them, as i understand it one of the best in the world, makes one wonder why work for JMAR?, i think it is obvious, JMAR going way higher, because of it's importance for the future, in many areas... BIODATA OF DR YULI VLADIMIRSKY Dr. Vladimirsky is a Senior Research Fellow at SSLS, the most recent appointment, coming from the Center for X-ray Lithography at the University of Wisconsin-Madison. He received his M.S. in physics of metals in 1964 and his Ph.D. in physics and mathematics in 1970 from the Leningrad (now St.Petersburg) Polytechnic Institute. Since 1981 as a research scientist he worked at IBM Research Center on development of photo-, X-ray, and electron-beam lithography techniques for submicron imaging and nano-fabrication for VLSI technology. From 1987 Dr. Vladimirsky actively participated in establishing the IBM synchrotron based lithography facility at East Fishkill. From 1992 till 1996 he and Dr. Olga Vladimirsky continued this work at Louisiana State University. He is involved in studies of principal issues of High Aspect and High Resolution X-ray Lithography for MEMS, and Next Generation Lithographies for IC, including imaging; diffraction limits; illumination effects on resolution; distortion analysis; thermo-elastic phenomena; printed image distortions; thick resist processing, surface roughness and illumination uniformity. Over several years Dr. Vladimirsky has chaired SPIE sponsored conferences on Emerging Lithographic Technologies and Micromachining and Microfabrication.