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To: Jim Oravetz who wrote (8301)3/30/2000 7:42:00 AM
From: Jim Oravetz  Read Replies (1) | Respond to of 10921
 
Optical lithography defies the experts
by Robert Ristelhueber
eet.com

Will the next generation of ICs be built using optical lithography? "It is worth noting that this density of components can be achieved by present optical techniques," said Gordon Moore, "and does not require the more exotic electron beam operations which are being studied for the possibility of making even smaller structures."The legendary Intel co-founder made that comment in 1965, referring to transistors on 2 mil centers. Optical lithography has been buried more often than Dracula, but like that fabled creature it
keeps defying attempts to put a stake through its heart. For more than three decades, conventional wisdom has predicted that shrinking line widths would soon spell the demise of optical techniques in favor of electron beam, ion beam or X-ray lithography. Yet that day of reckoning continues to be postponed, leading some to question whether optical will ever meet the scrap heap.
"Even the greatest visionaries had no idea optical lithography would last as long as it has," said Dan Hutcheson, president of VLSI Research (San Jose, Calif.), who uncovered Moore's quote. "Part of it goes back to the philosophy underlying the scientific method, in which you only deal with facts and don't consider unknowns." snip....

Jim