SI
SI
discoversearch

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor.  We ask that you disable ad blocking while on Silicon Investor in the best interests of our community.  If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.
Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?


To: BillyG who wrote (24670)4/11/2000 10:42:00 AM
From: BillyG  Read Replies (1) | Respond to of 25960
 
Infineon selects 193nm Canon system............
semibiznews.com

Infineon picks Canon's 193-nm scanners for 300-mm fab, DRAMs with 0.1-micron features

Semiconductor Business News
(04/11/00, 10:21:50 AM EDT)

AMSTELVEEN, The Netherlands--Canon Inc.'s European Semiconductor
Equipment Division today said it will ship the company's first production-ready
193-nanometer step-and-scan lithography tools to Infineon Technologies AG for
fabrication of next-generation DRAMs on 300-mm wafers with 0.10-micron design
rules.

The initial order calls for Canon to ship several 300-mm argon-fluoride (ArF)
scanners to Infineon's Dresden Module 2 fab, said Masami Aou, senior general
manager of Canon Europa NV's Semiconductor Equipment Division here.
Infineon's Dresden fab, under a 300-mm joint venture with Motorola Inc., has
already reached high-yields in production of 64-megabit DRAMs, using 248-nm
scanners and 12-inch wafers. Munich-based Infineon plans to invest $1 billion to
process 300-mm (12-inch) wafers in Dresden (see March 31 story).

Infineon plans to move aggressively into DRAM production using 0.1-micron
features and deep-trench exposure characteristics, which requires 193-nm
exposure tools, said Johann Harter, senior vice president of frontend
manufacturing at the Munich company. Infineon selected the Canon 300-mm
scanner after evaluating tools for lens system quality and overlay performance,
which were decisive factors, according to Harter. No timetable was given for the
0.10-micron production of memories.

Canon said its ArF scanner are based on its 5000 Series scanning platform,
which is suitable for either 200- or 300-mm wafer production. The 193-nm scanner
uses a 4X reduction lens for single exposures over a 26-by-33 mm field size. Its
reduction projection lens system incorporates high-purity calcium fluoride
elements and aspherical surfaces for high-contrast imaging and extremely low
distortion, said the Japanese lithography supplier.