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Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?


To: FJB who wrote (24891)5/12/2000 9:48:00 AM
From: Berk  Respond to of 25960
 
Bob, like you, I believe that we are in a very strong up cycle that will last for some time to come. My reasoning is simply that as semi technology becomes more pervasive it would seem that the cycle would become more extended in time. With that thought in mind would it somehow explain the diversity in performance within the semi equip sector? On this thread we are all well aware of CYMI's poor showing but there is also LRCX, KLAC and ASML, none of which are minor players (I would look for the low tier to move at the end of the cycle). I don't think relative valuations explain the disparity (look at ASYT, PRIA, etc) regardless of the metric. I would appreciate any thoughts that you might have. TIA



To: FJB who wrote (24891)5/12/2000 11:13:00 AM
From: Proud_Infidel  Read Replies (1) | Respond to of 25960
 
Micron joins EUV consortium
By David Lammers
EE Times
(05/11/00, 2:59 p.m. EST)

LIVERMORE, Calif. ? Micron Technology Inc. has joined Extreme Ultra Violet LLC, a consortium seeking to develop ultraviolet lithography for the 70-nanometer process generation and below.

Other members of the next-generation lithography consortium include Intel Corp., Advanced Micro Devices Inc., Motorola Inc., Infineon Technologies, and the Virtual National Laboratory, which consists of three national laboratories ? Lawrence Livermore National Laboratory, Sandia National Laboratories and Lawrence Berkeley National Laboratory.



To: FJB who wrote (24891)5/16/2000 11:12:00 AM
From: Proud_Infidel  Respond to of 25960
 
Cymer Inc. Reiterated 'Top Pick' at ABN Amro
5/16/00 4:35:00 AM
Source: Bloomberg News

Princeton, New Jersey, May 16 (Bloomberg Data) -- Cymer Inc. (CYMI US) was reiterated ''top pick'' by analyst David Wu at ABN Amro. The 12-month target price is $75.00 per share.



To: FJB who wrote (24891)5/18/2000 5:07:00 PM
From: FJB  Read Replies (1) | Respond to of 25960
 
TOKYO--(BUSINESS WIRE)--May 17, 2000--Komatsu Ltd. and Ushio Inc. have basically agreed to form a joint venture to undertake R&D, manufacture, sales, service and all other aspects of business related to excimer laser as the light source for lithography tools used in semiconductor manufacturing. Plans call for working out the details to facilitate a conclusion of the formal agreement within July.
Innovation of the process technology related lithography has been not only brisk, but also made such technologies increasingly sophisticated, resulting in increased minuteness of semiconductor device design rule (pattern width) year after year. For that matter, the importance of the roles to be played by manufacturers of light sources has also increased.
Conventionally, steppers using mercury lamps as the light source were used to produce devices. However, now that production lines indispensably relying upon steppers using excimer lasers as the light source are on the sharp increase, market needs for excimer lasers are expected to rise further ahead.
As the world's leader in the field, Komatsu began to work on the R&D of excimer lasers in the early 1980s, culminating in the successful development in 1987 of excimer laser as the light source for steppers used in semiconductor manufacturing. Entering the excimer laser business in 1996 as a fully-fledged operation, it has grown to claim more than 15 percent of the excimer laser market in the world today.
In terms of R&D, in addition to the current mainstay laser products, such as the G10K and G20K series (KrF(Krypton Fluorine) excimer lasers), Komatsu has already completed the development of ArF(Argon Fluorine) excimer laser which is expected to be the next-generation light source.
Ushio, in the meantime, is the leading manufacturer of industrial lamps, starting production and sales of mercury lamps (g line, i line) since 1960 as the light source for mask aligners and steppers used in semiconductor manufacturing. Today, it has established an overwhelming position in the field, dominating more than 75 percent of the market at home and abroad.
On the back of its globally deployed sales and service networks, Ushio has earned the deep trust and satisfaction of its customers. Currently the company is also vigorously working on the development of ArF excimer laser, which began in 1997, as the next-generation light source for steppers with plans calling for commercialization of successfully developed 4kHz20W ArF excimer laser having the world's highest level of performance, beginning in 2001.
By converging both Ushio's globally established reliability as well as its solid sales and service bases at home and abroad, as a pioneer of the stepper light source and Komatsu's leading-edge technologies and superb production systems, the joint venture is expected to dramatically boost the global development of their excimer laser business.
In addition, both companies have started joint development of F2 laser by participating in the F2 lithography development project commissioned to the ASET (Association of Super-Advanced Electronic Technologies) by NEDO (New Energy Industrial Technology Development Organization). Likewise, through increased efficiency as well as synergy such a convergence would bring about in the development of laser products beyond the next-generation ones, it is also expected to facilitate the launch of new products faster than its rivals. Drawing on such a synergy, the joint venture will aim to expeditiously deploy its fully-fledged global strategy in order to establish the top share of the world's market.
Under the basic agreement, plans call for each joint venture partner equally sharing its capital of 2,000 million yen and utilizing both companies' existing facilities for production, development and sales. With the launching date of the merged company set for August 1, both parties will jointly proceed with detailed consultations and preparation activities. The new company will strive to expand its business with the prospect of offering an IPO and listing in the future.