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To: Q. who wrote (2908)	6/30/2000 4:09:23 PM
From: Running Bull	Read Replies (2) \| Respond to of 3661

From a simple perspective, CFM and Steag make machines that apply wet chemicals used in process steps in the making of wafers...Most of these steps involve a final "rinse" or clean step. This is a lot like washing dishes. The wafers are dunked in a solution and then rinsed with water. One problem this creates is when the "dishes" air dry, there are water spots left. CFM and Steag are fighting over who owns the rights to a process that uses Isopropal Alcohol as a final rinse. The alcohol drives off the water so that the dishes don't have any spots on them. Just like Cascade claims to do for dishwashing. Spots on the dishes cause defects in devices and that creates yield losses. So the cleaner your machine can leave the wafers, the higher the yield.