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To: Peter V who wrote (13820)	8/22/2000 6:50:37 PM
From: The Ox	Read Replies (1) \| Respond to of 14427

I guess photolithography is for imprinting a pattern on the chip and the isotropic etch systems are for removing the photoresist material after the pattern is imprinted. Is that close? I'm a novice in the complete processes of making ICs but I sure am learning a lot during my research. I may be showing how little I really know by trying to explain the differences to you! CVD - chemical vapor deposition (note there are many different forms of CVD) create the layers of compounds on a wafer. After these layers are deposited, a circuit will be masked and etched into the wafer. There are polishing processes and striping processes that are used to clean up the wafer after different stages. Photolithography and etching are processes used to create the design in the wafer substrate. Here's a link on micromachining on a poly-SiC surface. Read it slowly (or a few times) and I bet you will start to understand the process. I hope this is not too technical. I also suggest surfing this site, click on Growth to learn about their process for APCVD. Keep in mind that this link is focusing on "their" process for creating specific ICs but I think if you can grasp what their doing you can translate it into a more "generic" understanding of how you create an IC. mems.cwru.edu I hope this helps!