To: FJB who wrote (4442 ) 11/16/2000 4:30:39 PM From: Proud_Infidel Respond to of 5867 Lam aims etch platform at all process steps on 200-, 300-mm wafers Semiconductor Business News (11/16/00, 02:14:22 PM EDT) FREMONT, Calif.--Lam Research Corp. today announced what the company says it the industry's first etch platform series capable of handling both 200- and 300-mm wafers as well as a wide range of process applications in next-generation fabs. The company said its 2300 platform is an open architecture capable of handling four process modules for all etch applications needed in 0.13-micron and below technologies. Lam said its 2300 etch series has been used in the field for more than two years. The company cited an "Etch Tool Readiness" award for 300-mm systems received this year from the Semiconductor 300 joint-venture fab operated by Infineon Technologies AG and Motorola Inc. in Dresden, Germany. The new platform features Lam's Exelan Dielectric 2300, Versys Silicon 2300, and Versys Metal 2300 Etch Systems, which are aimed at handling all the etch applications needed for chip fabrication. The platform has been designed to act as a "bridge tool," enabling wafer fabs to use the system to start new processes on 200-mm (8-inch) substrates before migrating them to larger 300-mm (12-inch) wafers. "The inherent flexibility and low risk of implementing new process and monitoring technologies provides customers with a distinct competitive advantage," said David Hemker, vice president of new product development at Lam. Lam said the new 2300 platform includes improvements to widely used dual-frequency confined and transformer coupled plasma etch technology. These enhancements are aimed at handling complex process integration requirements and new process materials being introduced in next-generation ICs, said the company. The platform uses modular software for advanced factory automaton and process control. The new software also features a Web-enabled architecture to support communications from remote locations and shared development and troubleshooting capabilities, Lam said. The Exelan Dielectric 2300 etch system enables chip-processing fabs to apply dual-frequency confined plasma technology on 300-mm wafers. The design of the Exelan 2300 enable in situ photoresist strip and barrier removal steps to be integrated in copper damascene processes, according to Lam. The Versys Silicon 2300 etch system supports a range of process applications for 130-nm technology, including advanced gate BARC (bottom anti-reflective coating) and shallow-trench isolation (STI) in the same etch chamber. The Versys Silicon etch system uses Lam's ceramic-free chamber to provide in situ waferless auto cleaning steps for high meantime between wet cleans and improved particle performance for high yields, according to Lam.