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To: EricRR who wrote (127554)	2/16/2001 2:29:11 PM
From: semiconeng	Read Replies (2) \| Respond to of 186894

So the 0.13 fab in Oregon which uses 300mm, will not be exclusively 300mm? I'm saying you don't need 300mm to do 0.13u. Saying they "Are The Same", is an incorrect statement. They are different projects, not combined. 300mm will have 0.13u, but 300mm is not needed for 0.13u as the analyist implied. Semi

To: EricRR who wrote (127554)	2/16/2001 2:39:39 PM
From: fingolfen	Read Replies (1) \| Respond to of 186894

Or are you saying that there will be more than one place to make a chip in Oregon? Actually that statement may be correct. If I remember correctly, the "D1" series of fabs have all been in Oregon. Intel's 0.18 micron process was developed in a facility (which if memory serves was D1B), which is now Fab 20. Albert's post indicated that 0.13 micron was already ramping in F20... 300mm 0.13 micron was slated to be in a building called D1C... This could be a second fab in Oregon.