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To: fyodor_ who wrote (37720)	4/28/2001 4:31:07 PM
From: kapkan4u	Read Replies (2) \| Respond to of 275872

Thanks for the link. How long would it take to validate the new tools? Looks like Intel's 130nm ramp is in serious trouble. Kap

To: fyodor_ who wrote (37720)	4/29/2001 12:59:25 AM
From: Mani1	Read Replies (1) \| Respond to of 275872

fyo re <<Smaller than the wavelength of light, eh? ;-)>> Yes. The wave length of the light is the reason for all this fuss. Current 248 tools (wave length of 248 nm) does just fine at 250 or 180 nm lithography. But it can not do well at 130 so phase mask shift must be used. By shifting the mask, certain part of the wavelength is filtered. This trick work very well and extended the life span for visible light. But for .25 micron and below, DUV became the light source used by everyone. All current steppers from ASML, SVG, Nikon and Canon are 248 tools, few next generation tools have been shipped for process development. The next generation tools are have 193 nm light source for the itho. Robert Grutza knows a lot about this stuff. Mani

To: fyodor_ who wrote (37720)	4/29/2001 5:37:08 PM
From: Bill Jackson	Read Replies (1) \| Respond to of 275872

fyo, Smaller than a wavelength of light is easy. When you get down to the Abbe limit of 1/2 a wavelength you have pretty much reached the limit, unless you use those diffraction tools that exploit fring reinforcement patterns. Looking at the masks for those you see all kinds of spurs and incut as well as outcut blocks on the corners that fool the light into beating the Abbe limit. This from a casual search under the topic, such as. >>>> A physical limit to how focused a beam of light can be. Due to its wave nature (delocalization), light can only be focused to a point as small as half its wavelength by traditional methods. Thus, in order to obtain optical resolution below the wavelength of the light being used, this barrier must be passed. Also known as the Abbe barrier. Some pages of interest. semiconductorfabtech.com chipcenter.com Bill