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To: Dan3 who wrote (136513)	6/3/2001 12:07:15 PM
From: dale_laroy	Respond to of 186894

>Can't they use the 248nm steppers at Austin? (if they're of any use at all, by then)< They are already using 248nm steppers at Austin, almost exclusively. Best bet would be transferring them to FASL 3 for its ramp, but this does not seem to be the plan. Personally, I would have tried to coordinate the ramps of new FASL fabs to the transition to smaller design rules at Fab25. For example, I would have timed FASL 2 to ramp as Fab25 was moving from 300nm for K6 production to 250nm for K6-2 production, using the displaced equipment from Fab25 to ramp production at FASL 2, then replaced the older equipment at FASL 1 with the displaced equipment from Fab25, as Fab25 was upgraded to 248nm lithography. It is however, fairly obvious from the design rules being used at the FASL fabs that this has not been the historical pattern. And, since FASL 3 will be ramping at 0.23-microns even as the 0.18-micron equipment at Fab30 (and possibly Fab25) is being replaced with 0.13-micron equipment, it would not appear to be the case for FASL 3 either.